Shining light on nanolayers for next-generation solar energy

Samenvatting

To fulfil our future needs for sustainable and clean energy, new designs of solar cells, batteries, and catalysts are currently being developed in which nanostructuring of materials is key. Atomic layer deposition (ALD) is an enabling technology in this development due to its unparalleled ability to uniformly deposit nanometer-thick films on 3-dimensional surfaces.

The aim of this project is to elucidate the reaction mechanisms of ALD processes relevant for next-generation solar energy by using various in situ techniques involving infrared and synchrotron light. A better understanding of these ALD processes enables the deposition of films with control of the composition and crystallographic phase, which will have a revolutionary impact on the performance of solar energy devices. The focus is on catalytic films for photoelectrochemical synthesis of solar fuels, and transparent-conducting-oxide films for solar cells. The innovative approach of using synchrotron radiation allows for studying the fundamental surface chemistry of ALD with greatly enhanced resolution and sensitivity.

The applicant has high expertise in the unravelling of ALD mechanisms, and Stanford University offers a unique set of advanced experimental techniques. The leading research atmosphere of Stanford will provide the applicant with the experience to establish himself as a senior researcher.

Output

Wetenschappelijk artikel

  • I Narkeviciute, P. Chakthranont, A.J.M. Mackus, C. Hahn, B.A. Pinaud, S.F. Bent, T.F. Jaramillo(2016): Tandem Core−Shell Si−Ta3N5 Photoanodes for Photoelectrochemical Water Splitting Nano Letters pp. 7565 - 7572
  • C. Hägglund, T. Grehl, J.T. Tanskanen, Y.S. Yee, M.N. Mullings, A.J.M. Mackus, C. MacIsaac, B.M. Clemens, H.H. Brongersma, S.F. Bent(2016): Growth, intermixing, and surface phase formation for zinc tin oxide nanolaminates produced by atomic layer deposition Journal of Vacuum Science & Technology A pp. 21516 - 8
  • W.-H. Kim, F.S.M. Hashemi, A.J.M. Mackus, J. Singh, Y. Kim, D. Bobb-Semple, Y. Fan, T. Kaufman-Osborn, L. Godet, S.F. Bent(2016): A Process for Topographically Selective Deposition on 3D Nanostructures by Ion Implantation ACS Nano pp. 4451 - 4458
  • A.J.M. Mackus, C. MacIsaac, W.-H. Kim, S.F. Bent(2017): Incomplete elimination of precursor ligands during atomic layer deposition of zincoxide, tin-oxide, and zinc-tin-oxide Journal of Chemical Physics pp. 052802 - 052802-11
  • A.J.M. Mackus, C. MacIsaac, W.-H. Kim, S.F. Bent(2017): Incomplete elimination of precursor ligands during atomic layer deposition of zincoxide, tin-oxide, and zinc-tin-oxide Journal of Chemical Physics pp. 52802 - 52811
  • J.A. Singh, N.F.W. Thissen, W.-H. Kim, H. Johnson, W.M.M. Kessels, A.A. Bol, S.F. Bent, A.J.M. Mackus(2018): Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation Chemistry of Materials pp. 663 - 670

Kenmerken

Projectnummer

680-50-1309

Hoofdaanvrager

Dr. ir. A.J.M. Mackus

Verbonden aan

Stanford University, Department of Chemical Engineering

Uitvoerders

Dr. ir. A.J.M. Mackus

Looptijd

01/06/2014 tot 31/01/2016