ARCNL

Advanced Research Center for Nanolithography

ARCNL is an Institute that is part of NWO-I, the Institutes Organisation of NWO. ARCNL focuses on the fundamental physics underlying the current and future nanolithography techniques especially for applications in the semiconductor industry.

The Advanced Research Center for Nanolithography (ARCNL) has been set up as a result of a collaboration between ASML, NWO-I, the Netherlands Organisation for Scientific Research (NWO), the University of Amsterdam and VU University Amsterdam. It forms a new type of organisation within NWO that combines the best of both worlds: the advantages and scientific strength of NWO with the finances and governance of the private parties.
The public-private funded ARCNL is a collaboration between ASML, NWO, UvA and VU. ARCNL started under AMOLF and is an independent centre executed by NWO-I as of 1 September 2015.

ARCNL's mission
ARCNL focuses on the fundamental physics underlying the current and future nanolithography techniques especially for applications in the semiconductor industry. The scientific programme of ARCNL is therefore tightly linked to ASML's areas of expertise. A large proportion of the initial programme focuses on the physical or chemical processes that are crucial to nanolithography with extreme ultraviolet (EUV) light.

ARCNL was established in 2014 as a unit within AMOLF and is expected to become a completely independent institution within the FOM organisation in 2015. It is ARCNL's ambition to gain a top position in the research in the field of nanolithography.

Website


Address

Science Park 110
1098 XG Amsterdam, The Netherlands

tel: +31 (0)20 851 71 00